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dc.contributor.authorHu, Vita Pi-Hoen_US
dc.contributor.authorWu, Yu-Shengen_US
dc.contributor.authorFan, Ming-Longen_US
dc.contributor.authorSu, Pinen_US
dc.contributor.authorChuang, Ching-Teen_US
dc.date.accessioned2014-12-08T15:24:25Z-
dc.date.available2014-12-08T15:24:25Z-
dc.date.issued2009en_US
dc.identifier.isbn978-1-4244-2784-0en_US
dc.identifier.urihttp://hdl.handle.net/11536/16943-
dc.description.abstractThis paper investigates the Static Noise Margin (SNM) of Ultra-Thin-Body (UTB) SOI SRAM cells operating in subthreshold region using analytical solution of Poisson's equation validated with TCAD simulations. An analytical SNM model for UTB SOI SRAM cells operating in subthreshold region is presented. Our results indicate that back-gate bias (V(bg)) can mitigate the Read SNM (RSNM) variability of UTB SO[ SRAM cells in the subthreshold region, and the improvement of SNM variability is more significant than superthreshold region. Increasing cell beta-ratio shows limited improvement on RSNM and has no benefit on SNM variability for subthreshold operation. The UTB SOI 8T SRAM cell exhibits RSNM 2X larger than the 6T SRAM cell in subthreshold region.en_US
dc.language.isoen_USen_US
dc.titleInvestigation of Static Noise Margin of Ultra-Thin-Body SOI SRAM Cells in Subthreshold Region using Analytical Solution of Poisson's Equationen_US
dc.typeProceedings Paperen_US
dc.identifier.journalPROCEEDINGS OF TECHNICAL PROGRAM: 2009 INTERNATIONAL SYMPOSIUM ON VLSI TECHNOLOGY, SYSTEMS AND APPLICATIONSen_US
dc.citation.spage115en_US
dc.citation.epage116en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000272451000051-
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