完整後設資料紀錄
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dc.contributor.authorHsieh, Tsang-Yenen_US
dc.contributor.authorWang, Jyh-Liangen_US
dc.contributor.authorYang, Po-Yuen_US
dc.contributor.authorHwang, Chuan-Chouen_US
dc.contributor.authorShye, Der-Chien_US
dc.date.accessioned2014-12-08T15:24:26Z-
dc.date.available2014-12-08T15:24:26Z-
dc.date.issued2012-07-01en_US
dc.identifier.issn1533-4880en_US
dc.identifier.urihttp://dx.doi.org/10.1166/jnn.2012.6239en_US
dc.identifier.urihttp://hdl.handle.net/11536/16948-
dc.description.abstractThe Al-doped ZnO (AZO) nanostructures field-emission arrays (FEAs) were hydrothermally synthesized on AZO/glass substrate. The samples with Al-dosage of 3 at.% show the morphology as nanowires vertically grown on the substrates and a structure of c-axis elongated single-crystalline wurtzite. The good field-emission (i.e., the large anode current and low fluctuation of 15.9%) can be found by AZO nanostructure FEAs with well-designed Al-dosage (i.e., 3 at.%) because of the vertical nanowires with the less structural defects and superior crystallinity. Moreover, the Full width at half maximum (FWHM) of near band-edge emission (NBE) decreased as the increase of annealing temperature, representing the compensated structural defects during oxygen ambient annealing. After the oxygen annealing at 500 degrees C, the hydrothermal AZO nanostructure FEAs revealed the excellent electrical characteristics (i.e., the larger anode current and uniform distribution of induced fluorescence) and enhanced field-emission stability (i.e., the lowest current fluctuation of 5.97%).en_US
dc.language.isoen_USen_US
dc.subjectAluminum-Doped Zinc Oxide (AZO)en_US
dc.subjectHydrothermal Methoden_US
dc.subjectField-Emissionen_US
dc.subjectStabilityen_US
dc.subjectNanostructureen_US
dc.titleField-Emission Stability of Hydrothermally Synthesized Aluminum-Doped Zinc Oxide Nanostructuresen_US
dc.typeArticleen_US
dc.identifier.doi10.1166/jnn.2012.6239en_US
dc.identifier.journalJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGYen_US
dc.citation.volume12en_US
dc.citation.issue7en_US
dc.citation.spage5453en_US
dc.citation.epage5458en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000307604700058-
dc.citation.woscount7-
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