完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | KU, TK | en_US |
dc.contributor.author | CHEN, MS | en_US |
dc.contributor.author | WANG, CC | en_US |
dc.contributor.author | FENG, MS | en_US |
dc.contributor.author | HSIEH, IJ | en_US |
dc.contributor.author | HUANG, JCM | en_US |
dc.contributor.author | CHENG, HC | en_US |
dc.date.accessioned | 2014-12-08T15:03:09Z | - |
dc.date.available | 2014-12-08T15:03:09Z | - |
dc.date.issued | 1995-10-01 | en_US |
dc.identifier.issn | 0021-4922 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/1709 | - |
dc.description.abstract | A new two-dimensional numerical simulation which can accurately reproduce the empirical electrical characteristics of vertical field-emission triodes (FET's) with various gate geometries has been developed. The electrical characteristics of volcano-shaped-gate FET's were simulated for the first time and compared with those of planar-gate ones. Volcano-shaped-gate FET's exhibit significant advantages over planar-gate ones due to their superior current-voltage (I-V) properties and larger tolerance of fabrication error. A reasonable definition of emission area was obtained by applying the non-uniform current density model. For sub-micron gate aperture, the gate current is obvious only if the device structure is deeply tip-recessed. On the basis of the evaluation of the device structures including the tip cone angle, the related tip-to-gate height, the emitter shape, and the shrinkage of gate aperture, a high-aspect-ratio conical emitter with a small tip radius will be the optimum structure of FET's for low-voltage operation. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | FIELD-EMISSION TRIODES (FETS) | en_US |
dc.subject | VOLCANO-SHAPED GATE | en_US |
dc.subject | GATE APERTURE | en_US |
dc.subject | TIP-TO-GATE HEIGHT | en_US |
dc.subject | EMITTER SHAPE | en_US |
dc.title | SIMULATION OF THE ELECTRICAL CHARACTERISTICS OF FIELD-EMISSION TRIODES WITH VARIOUS GATE STRUCTURES | en_US |
dc.type | Article | en_US |
dc.identifier.journal | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | en_US |
dc.citation.volume | 34 | en_US |
dc.citation.issue | 10 | en_US |
dc.citation.spage | 5789 | en_US |
dc.citation.epage | 5796 | en_US |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:A1995TF79500058 | - |
dc.citation.woscount | 14 | - |
顯示於類別: | 期刊論文 |