完整後設資料紀錄
DC 欄位語言
dc.contributor.authorKU, TKen_US
dc.contributor.authorCHEN, MSen_US
dc.contributor.authorWANG, CCen_US
dc.contributor.authorFENG, MSen_US
dc.contributor.authorHSIEH, IJen_US
dc.contributor.authorHUANG, JCMen_US
dc.contributor.authorCHENG, HCen_US
dc.date.accessioned2014-12-08T15:03:09Z-
dc.date.available2014-12-08T15:03:09Z-
dc.date.issued1995-10-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://hdl.handle.net/11536/1709-
dc.description.abstractA new two-dimensional numerical simulation which can accurately reproduce the empirical electrical characteristics of vertical field-emission triodes (FET's) with various gate geometries has been developed. The electrical characteristics of volcano-shaped-gate FET's were simulated for the first time and compared with those of planar-gate ones. Volcano-shaped-gate FET's exhibit significant advantages over planar-gate ones due to their superior current-voltage (I-V) properties and larger tolerance of fabrication error. A reasonable definition of emission area was obtained by applying the non-uniform current density model. For sub-micron gate aperture, the gate current is obvious only if the device structure is deeply tip-recessed. On the basis of the evaluation of the device structures including the tip cone angle, the related tip-to-gate height, the emitter shape, and the shrinkage of gate aperture, a high-aspect-ratio conical emitter with a small tip radius will be the optimum structure of FET's for low-voltage operation.en_US
dc.language.isoen_USen_US
dc.subjectFIELD-EMISSION TRIODES (FETS)en_US
dc.subjectVOLCANO-SHAPED GATEen_US
dc.subjectGATE APERTUREen_US
dc.subjectTIP-TO-GATE HEIGHTen_US
dc.subjectEMITTER SHAPEen_US
dc.titleSIMULATION OF THE ELECTRICAL CHARACTERISTICS OF FIELD-EMISSION TRIODES WITH VARIOUS GATE STRUCTURESen_US
dc.typeArticleen_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.citation.volume34en_US
dc.citation.issue10en_US
dc.citation.spage5789en_US
dc.citation.epage5796en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:A1995TF79500058-
dc.citation.woscount14-
顯示於類別:期刊論文


文件中的檔案:

  1. A1995TF79500058.pdf

若為 zip 檔案,請下載檔案解壓縮後,用瀏覽器開啟資料夾中的 index.html 瀏覽全文。