標題: | High-performance In0.52Al0.48As/In(0.6)Ga(0.)4As power metamorphic HEMT for Ka-band applications |
作者: | Chang, Chia-Yuan Chang, Edward Yi Lien, Yi-Chung Miyamoto, Yasuyuki Chen, Szu-Hung Chu, Li-Hsin 材料科學與工程學系 Department of Materials Science and Engineering |
公開日期: | 2006 |
摘要: | A 70-nm In0.52Al0.48As/In0.6Ga0.4As power MHEMT with double delta-doping was fabricated and evaluated. The device has a high transconductance of 827 mS/mm. The saturated drain-source current of the device is 890 mA/mm. A current gain cutoff frequency (f(T)) of 200 GHz and a maximum oscillation frequency of 300 GHz were achieved due to the nanometer gate length and the high Indium content in the channel. When measured at 32 GHz, the 4 x 40 mu m device demonstrates a maximum output power of 14.5 dBm with P1dB of 11.1 dBm and the power gain is 9.5 dB. The excellent DC and RF performance of the 70-nm MHEMT shows a great potential for Ka-band power applications. |
URI: | http://hdl.handle.net/11536/17216 http://dx.doi.org/10.1109/SMELEC.2006.381095 |
ISBN: | 978-0-7803-9730-9 |
DOI: | 10.1109/SMELEC.2006.381095 |
期刊: | 2006 IEEE International Conference on Semiconductor Electronics, Proceedings |
起始頁: | 422 |
結束頁: | 424 |
Appears in Collections: | Conferences Paper |
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