Circuit performance degradation of sample-and-hold amplifier due to gate-oxide overstress in a 130-nm CMOS process

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DC 欄位	值	語言
dc.contributor.author	Chen, Jung-Sheng	en_US
dc.contributor.author	Ker, Ming-Dou	en_US
dc.date.accessioned	2014-12-08T15:25:06Z	-
dc.date.available	2014-12-08T15:25:06Z	-
dc.date.issued	2006	en_US
dc.identifier.isbn	0-7803-9498-4	en_US
dc.identifier.uri	http://hdl.handle.net/11536/17479	-
dc.identifier.uri	http://dx.doi.org/10.1109/RELPHY.2006.251334	en_US
dc.description.abstract	The effect of gate-oxide reliability on MOS switch in the bootstrapped circuit is investigated with the sample-and-hold amplifier in a 130-nm CMOS process. After overstress on the MOS switch of sample-and-hold amplifier, the circuit performances in the frequency domain are measured to verify the impact of gate-oxide reliability on circuit performance.	en_US
dc.language.iso	en_US	en_US
dc.title	Circuit performance degradation of sample-and-hold amplifier due to gate-oxide overstress in a 130-nm CMOS process	en_US
dc.type	Proceedings Paper	en_US
dc.identifier.doi	10.1109/RELPHY.2006.251334	en_US
dc.identifier.journal	2006 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM PROCEEDINGS - 44TH ANNUAL	en_US
dc.citation.spage	705	en_US
dc.citation.epage	706	en_US
dc.contributor.department	電機學院	zh_TW
dc.contributor.department	College of Electrical and Computer Engineering	en_US
dc.identifier.wosnumber	WOS:000240855800149	-
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