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dc.contributor.authorCHAO, YFen_US
dc.contributor.authorWEI, CSen_US
dc.contributor.authorLEE, WCen_US
dc.contributor.authorLIN, SCen_US
dc.contributor.authorCHAO, TSen_US
dc.date.accessioned2014-12-08T15:03:12Z-
dc.date.available2014-12-08T15:03:12Z-
dc.date.issued1995-09-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.34.5016en_US
dc.identifier.urihttp://hdl.handle.net/11536/1764-
dc.description.abstractUsing first-order treatment on azimuth errors of the polarizer (P) and analyzer (A) with respect to the plane of incidence (POI), we construct two intensity ratios around a certain configuration: such as P = +/- pi/4 and A = 0 as compared to A = pi/2. These expressions can be used not only to align the azimuths of the polarizer and analyzer to the POI, hut also to obtain the ellipsometric parameter phi without locating the minimum intensity, BK7 glass and SiO2/Si thin film are ultilized to evaluate this technique.en_US
dc.language.isoen_USen_US
dc.subjectELLIPSOMETRYen_US
dc.subjectPOLARIMETRYen_US
dc.subjectREFRACTIVE INDEXen_US
dc.subjectTHIN FILMen_US
dc.titleELLIPSOMETRIC MEASUREMENTS AND ITS ALIGNMENT - USING THE INTENSITY RATIO TECHNIQUEen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.34.5016en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.citation.volume34en_US
dc.citation.issue9Aen_US
dc.citation.spage5016en_US
dc.citation.epage5019en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.identifier.wosnumberWOS:A1995RX26800080-
dc.citation.woscount9-
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