標題: Low noise and high gain RF MOSFETs on plastic substrates
作者: Kao, HL
Chin, A
Huang, CC
Hung, BF
Chiang, KC
Lai, ZM
McAlister, SP
Chi, CC
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: RF noise;associated gain;MOSFET;plastic
公開日期: 2005
摘要: A low minimum noise figure (NFmin) of 1.2 dB and high associated gain of 12.8 dB at 10 GHz, were measured for 0.18 mu m RF MOSFETs on plastic, made by substrate thinning (similar to 30 mu m), transfer and bonding. The performance can be further improved to 0.96 dB NFmin and 14.1 dB associated gain at 10 GHz, under applied tensile strain, using flexible Si on plastic. A 3.5 nH inductor on plastic showed a 55% higher Q-factor with a wider frequency range, compared with that on a Si substrate.
URI: http://hdl.handle.net/11536/17808
http://dx.doi.org/10.1109/MWSYM.2005.1516584
ISBN: 0-7803-8845-3
ISSN: 0149-645X
DOI: 10.1109/MWSYM.2005.1516584
期刊: 2005 IEEE MTT-S International Microwave Symposium, Vols 1-4
起始頁: 295
結束頁: 298
Appears in Collections:Conferences Paper


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