完整後設資料紀錄
DC 欄位語言
dc.contributor.authorGu, SHen_US
dc.contributor.authorWang, MTen_US
dc.contributor.authorChan, CTen_US
dc.contributor.authorZous, NKen_US
dc.contributor.authorYeh, CCen_US
dc.contributor.authorTsai, WJen_US
dc.contributor.authorLu, TCen_US
dc.contributor.authorWang, THen_US
dc.contributor.authorKu, Jen_US
dc.contributor.authorLu, CYen_US
dc.date.accessioned2014-12-08T15:25:47Z-
dc.date.available2014-12-08T15:25:47Z-
dc.date.issued2004en_US
dc.identifier.isbn0-7803-8315-Xen_US
dc.identifier.urihttp://hdl.handle.net/11536/18211-
dc.identifier.urihttp://dx.doi.org/10.1109/RELPHY.2004.1315428en_US
dc.description.abstractThe lateral distribution of programmed charge in a hot electron program/hot hole erase nitride storage flash cell is investigated by using a charge pumping technique. Our study shows that the secondly programmed bit has a wider trapped charge distribution than the first programmed bit. In addition, we find prograrnmed charge spreads further into the channel with program/erase cycle number.en_US
dc.language.isoen_USen_US
dc.titleInvestigation of programmed charge lateral spread in a two-bit storage nitride flash memory cell by using a charge pumping techniqueen_US
dc.typeProceedings Paperen_US
dc.identifier.doi10.1109/RELPHY.2004.1315428en_US
dc.identifier.journal2004 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM PROCEEDINGSen_US
dc.citation.spage639en_US
dc.citation.epage640en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000222139900137-
顯示於類別:會議論文


文件中的檔案:

  1. 000222139900137.pdf

若為 zip 檔案,請下載檔案解壓縮後,用瀏覽器開啟資料夾中的 index.html 瀏覽全文。