標題: Constructing control process for wafer defects using data mining technique
作者: Tong, L
Lee, H
Huang, CF
Lin, CK
Yang, CH
工業工程與管理學系
Department of Industrial Engineering and Management
關鍵字: wafer defects;c-chart;defect clustering;adaptive control chart;data mining
公開日期: 2004
摘要: The wafer defects influence the yield of a wafer. The integrated circuits (IC) manufacturers usually use a Poisson distribution based c-chart to monitor the lot-to-lot wafer defects. As the wafer size increases, defects on wafer tend to cluster. When the c-chart is used, the clustered defects frequently cause erroneous results. The main objective of this study is to develop a hierarchical adaptive control process to monitor the clustered defects effectively and detect the wafer-to-wafer variation and lot-to-lot variation simultaneously using data mining technique.
URI: http://hdl.handle.net/11536/18334
ISBN: 7-5062-7342-X
期刊: SHAPING BUSINESS STRATEGY IN A NETWORKED WORLD, VOLS 1 AND 2, PROCEEDINGS
起始頁: 1125
結束頁: 1129
顯示於類別:會議論文