完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | MAA, JJ | en_US |
dc.contributor.author | WU, CY | en_US |
dc.date.accessioned | 2014-12-08T15:03:17Z | - |
dc.date.available | 2014-12-08T15:03:17Z | - |
dc.date.issued | 1995-07-01 | en_US |
dc.identifier.issn | 0018-9383 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1109/16.391208 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/1842 | - |
dc.description.abstract | The constant-field scaling theory (CONFIST) is evaluated in this work, The persistence of the drain-induced barrier lowering characteristics is selected to be essential condition of the CONFIST, Assessment on the accuracy of various constraint equations for MOS device miniaturization is carried out and the application limitations of these equations are studied in detail, The intrinsic incompleteness of the original CONFIST is then revealed by scaling the constraint equation, It is found that the restriction of requiring invariant Poisson equation after scaling in the original CONFIST must be released to prevent the scaling from being limited by the quasi-body effect, The original CONFIST is revised accordingly, and the modified version (CONFIST-2) shows that the application limit of the original CONFIST is about 0.5 mu m and the vertical dimensions must be scaled more than the lateral ones. | en_US |
dc.language.iso | en_US | en_US |
dc.title | A NEW CONSTANT-FIELD SCALING THEORY FOR MOSFETS | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1109/16.391208 | en_US |
dc.identifier.journal | IEEE TRANSACTIONS ON ELECTRON DEVICES | en_US |
dc.citation.volume | 42 | en_US |
dc.citation.issue | 7 | en_US |
dc.citation.spage | 1262 | en_US |
dc.citation.epage | 1268 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:A1995RE53000010 | - |
dc.citation.woscount | 4 | - |
顯示於類別: | 期刊論文 |