The effects of Pd2Si on the electroless plating Pd induced crystallization of amorphous silicon thin films

Abstract

Electroless plating Pd method has been used to induce crystallization of amorphous silicon through the formation of Pd2Si. Unfortunately, after crystallization, the Pd2Si residues in the Si film degraded the polycrystalline quality. In this study, a two-step annealing process was used to reduce the Pd2Si quantity. Besides, post-RTA treatment was used to improve the quality of poly-Si.