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dc.contributor.authorLin, Yuan-Paien_US
dc.contributor.authorChao, Yu-Chiangen_US
dc.contributor.authorMeng, Hsin-Feien_US
dc.contributor.authorZan, Hsiao-Wenen_US
dc.contributor.authorHorng, Sheng-Fuen_US
dc.date.accessioned2014-12-08T15:26:18Z-
dc.date.available2014-12-08T15:26:18Z-
dc.date.issued2011-10-12en_US
dc.identifier.issn0022-3727en_US
dc.identifier.urihttp://dx.doi.org/10.1088/0022-3727/44/40/405103en_US
dc.identifier.urihttp://hdl.handle.net/11536/18684-
dc.description.abstractIn junction absorber photovoltaics doped wide bandgap n-type and p-type semiconductors form a porous interpenetrating junction structure with a layer of low bandgap absorber at the interface. The doping concentration is high enough such that the junction depletion width is smaller than the pore size. The highly conductive neutral region then has a dentrite shape with fingers reaching the absorber to effectively collect the photo-carriers swept out by the junction electric field. With doping of 10(19) cm(-3) corresponding to a depletion width of 25 nm, pore size of 32 nm, absorber thickness close to exciton diffusion length of 17 nm, absorber bandgap of 1.4 eV and carrier mobility over 10(-5) cm(2) V(-1) s(-1), numerical calculation shows the power conversion efficiency is as high as 19.4%. It rises to 23% for a triplet exciton absorber.en_US
dc.language.isoen_USen_US
dc.titleWide bandgap n-type and p-type semiconductor porous junction devices as photovoltaic cellsen_US
dc.typeArticleen_US
dc.identifier.doi10.1088/0022-3727/44/40/405103en_US
dc.identifier.journalJOURNAL OF PHYSICS D-APPLIED PHYSICSen_US
dc.citation.volume44en_US
dc.citation.issue40en_US
dc.citation.epageen_US
dc.contributor.department物理研究所zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentInstitute of Physicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000295164100005-
dc.citation.woscount0-
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