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dc.contributor.authorKer, MDen_US
dc.contributor.authorTseng, TKen_US
dc.date.accessioned2014-12-08T15:26:22Z-
dc.date.available2014-12-08T15:26:22Z-
dc.date.issued2003en_US
dc.identifier.isbn0-7803-7976-4en_US
dc.identifier.urihttp://hdl.handle.net/11536/18721-
dc.description.abstractA novel electrostatic discharge (ESD) protection concept by using the already-on device is proposed to effectively protect CMOS integrated circuits (IC) in nanoscale CMOS processes against ESD stress. Such an already-on NMOS device is designed to have a threshold voltage of similar to0V, or even negative. When the IC is under the ESD zapping conditions, such already-on NMOS in CMOS IC are initially standing in the turn-on state and ready to discharge ESD current during any ESD zapping. So, such already-on NMOS has the fastest turn-on speed and the lowest trigger-on voltage to effectively protect the internal circuits with a much thinner gate oxide (similar to15Angstrom) in future sub-100nm CMOS technology. To keep such already-on devices off when the IC is under normal circuit operating condition, an onchip negative voltage generator realized by the diodes and capacitors is used to bias the gates of such already-on devices. The proposed already-on device and the on-chip negative voltage generator are fully process-compatible to the general sub-100nm CMOS processes.en_US
dc.language.isoen_USen_US
dc.subjectelectrostatic discharge (ESD)en_US
dc.subjectalready-on deviceen_US
dc.subjectthreshold voltageen_US
dc.subjectgate oxideen_US
dc.subjectnegative voltage generatoren_US
dc.titleNovel electrostatic discharge protection design for nanoelectronics in nanoscale CMOS technologyen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2003 THIRD IEEE CONFERENCE ON NANOTECHNOLOGY, VOLS ONE AND TWO, PROCEEDINGSen_US
dc.citation.spage737en_US
dc.citation.epage740en_US
dc.contributor.department電機學院zh_TW
dc.contributor.departmentCollege of Electrical and Computer Engineeringen_US
dc.identifier.wosnumberWOS:000185389900192-
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