完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Chen, MJ | en_US |
dc.contributor.author | Huang, HT | en_US |
dc.contributor.author | Huang, KC | en_US |
dc.contributor.author | Chen, PN | en_US |
dc.contributor.author | Chang, CS | en_US |
dc.contributor.author | Diaz, CH | en_US |
dc.date.accessioned | 2014-12-08T15:26:27Z | - |
dc.date.available | 2014-12-08T15:26:27Z | - |
dc.date.issued | 2002 | en_US |
dc.identifier.isbn | 0-7803-7462-2 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/18772 | - |
dc.description.abstract | The ratio of the mean-free-path to the critical length near the low-field source is key to channel backscattering characteristics in nanoFETs. To extract it, we perform temperature experiment from -40 degreesC to 75 degreesC on 17 Angstrom thick gate oxide MOSFETs with varying mask gate lengths down to 75 nm. In this paper we report that once the saturation drain current is measured against temperature, the mean-free-path lambda with respect to the critical length l can readily be assessed at pecific temperature. Dependencies on gate length, drain voltage, and gate voltage are then established that further enable nanoFETs scaling projections. The temperature dependent version of existing backscattering model is derived in this work. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Temperature dependent channel backscattering coefficients in nanoscale MOSFETs | en_US |
dc.type | Proceedings Paper | en_US |
dc.identifier.journal | INTERNATIONAL ELECTRON DEVICES 2002 MEETING, TECHNICAL DIGEST | en_US |
dc.citation.spage | 39 | en_US |
dc.citation.epage | 42 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000185143400008 | - |
顯示於類別: | 會議論文 |