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dc.contributor.authorKer, MDen_US
dc.contributor.authorChang, CYen_US
dc.contributor.authorChang, YSen_US
dc.date.accessioned2014-12-08T15:26:36Z-
dc.date.available2014-12-08T15:26:36Z-
dc.date.issued2002en_US
dc.identifier.isbn0-7803-7494-0en_US
dc.identifier.issn1063-0988en_US
dc.identifier.urihttp://hdl.handle.net/11536/18896-
dc.description.abstractThis paper reports a real case for ESD level improvement on a CMOS IC product with multiple separated power pins. After ESD stress, the internal damage has been found and located at the interface circuit connecting different circuit blocks with different power supplies. Some ESD designs are implemented to rescue this IC product to meet the required ESD specification. By adding only an extra ESD clamp NMOS with a channel width of 10 mum between the interface node and ground line, the HBM ESD level of this IC product can be improved from the original 0.5 kV to 3 kV. By connecting the separated VSS power lines through the ESD conduction circuit to a common VSS ESD bus realized by the seal ring, the HBM ESD level of the second version IC product with 12 separated power supplies pairs can be significantly improved from the original 1 kV up to > 5 kV, without noise coupling issue.en_US
dc.language.isoen_USen_US
dc.titleESD protection design to overcome internal damages on interface circuits of CMOS IC with multiple separated power pinsen_US
dc.typeProceedings Paperen_US
dc.identifier.journal15TH ANNUAL IEEE INTERNATIONAL ASIC/SOC CONFERENCE, PROCEEDINGSen_US
dc.citation.spage234en_US
dc.citation.epage238en_US
dc.contributor.department電機學院zh_TW
dc.contributor.departmentCollege of Electrical and Computer Engineeringen_US
dc.identifier.wosnumberWOS:000179659500041-
Appears in Collections:Conferences Paper