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dc.contributor.authorChen, RHen_US
dc.contributor.authorCheng, CMen_US
dc.date.accessioned2014-12-08T15:26:41Z-
dc.date.available2014-12-08T15:26:41Z-
dc.date.issued2001en_US
dc.identifier.isbn0-8194-4031-0en_US
dc.identifier.issn0277-786Xen_US
dc.identifier.urihttp://hdl.handle.net/11536/18963-
dc.identifier.urihttp://dx.doi.org/10.1117/12.436881en_US
dc.description.abstractIn this paper the coating properties including film thickness, thickness uniformity and variation of viscosity of SU8 photoresist were investigated by using a spin coater and rheometer. Experimental results indicate that the coating qualities of SU8 are affected by several factors including the spinning speed, the photoresist viscosity, the initial acceleration and the duration. Some recommendations are presented for increasing the quality of SU8 spin coating in thick-film processing.en_US
dc.language.isoen_USen_US
dc.subjectthick-layer resisten_US
dc.subjectSU-8en_US
dc.subjectthickness uniformityen_US
dc.subjectspin coatingen_US
dc.titleStudy of spin coating properties of SU-8 thick-layer photoresisten_US
dc.typeProceedings Paperen_US
dc.identifier.doi10.1117/12.436881en_US
dc.identifier.journalADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVIII, PTS 1 AND 2en_US
dc.citation.volume4345en_US
dc.citation.spage494en_US
dc.citation.epage501en_US
dc.contributor.department機械工程學系zh_TW
dc.contributor.departmentDepartment of Mechanical Engineeringen_US
dc.identifier.wosnumberWOS:000175176400052-
Appears in Collections:Conferences Paper


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