Study of spin coating properties of SU-8 thick-layer photoresist

doi:10.1117/12.436881

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DC 欄位	值	語言
dc.contributor.author	Chen, RH	en_US
dc.contributor.author	Cheng, CM	en_US
dc.date.accessioned	2014-12-08T15:26:41Z	-
dc.date.available	2014-12-08T15:26:41Z	-
dc.date.issued	2001	en_US
dc.identifier.isbn	0-8194-4031-0	en_US
dc.identifier.issn	0277-786X	en_US
dc.identifier.uri	http://hdl.handle.net/11536/18963	-
dc.identifier.uri	http://dx.doi.org/10.1117/12.436881	en_US
dc.description.abstract	In this paper the coating properties including film thickness, thickness uniformity and variation of viscosity of SU8 photoresist were investigated by using a spin coater and rheometer. Experimental results indicate that the coating qualities of SU8 are affected by several factors including the spinning speed, the photoresist viscosity, the initial acceleration and the duration. Some recommendations are presented for increasing the quality of SU8 spin coating in thick-film processing.	en_US
dc.language.iso	en_US	en_US
dc.subject	thick-layer resist	en_US
dc.subject	SU-8	en_US
dc.subject	thickness uniformity	en_US
dc.subject	spin coating	en_US
dc.title	Study of spin coating properties of SU-8 thick-layer photoresist	en_US
dc.type	Proceedings Paper	en_US
dc.identifier.doi	10.1117/12.436881	en_US
dc.identifier.journal	ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVIII, PTS 1 AND 2	en_US
dc.citation.volume	4345	en_US
dc.citation.spage	494	en_US
dc.citation.epage	501	en_US
dc.contributor.department	機械工程學系	zh_TW
dc.contributor.department	Department of Mechanical Engineering	en_US
dc.identifier.wosnumber	WOS:000175176400052	-
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