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dc.contributor.authorWen, TCen_US
dc.contributor.authorLee, SCen_US
dc.contributor.authorLee, WIen_US
dc.date.accessioned2014-12-08T15:26:44Z-
dc.date.available2014-12-08T15:26:44Z-
dc.date.issued2001en_US
dc.identifier.isbn0-8194-3956-8en_US
dc.identifier.issn0277-786Xen_US
dc.identifier.urihttp://hdl.handle.net/11536/19002-
dc.identifier.urihttp://dx.doi.org/10.1117/12.426844en_US
dc.description.abstractThis study invests the effect of barrier growth temperature on the properties of InGaN/GaN MQW. Increase the growth temperature will reduce the well thickness and result in the blue shift of the PL peak. This blue shift in FL peak wavelength may be resulted from the stain occure during varying barrier growth temperature rather than only the reduce the well width. Moreover, we introduce a phase separation enhance layer into InGaN/GaN MQW. This layer join with the variation of barrier growth temperature will enhance the phase separation in InGaN/GaN MQW. There are two peaks clearly revealed in RT PL spectra. The higher energy peak might originate the InGaN quasi-wetting layer on the GaN barrier surface. The other one is interpreted of localize state at potential fluctuation owning to phase separation.en_US
dc.language.isoen_USen_US
dc.subjectInGaN/GaN multiple quantum wellen_US
dc.subjectbarrier growth temperatureen_US
dc.subjectstrainen_US
dc.subjectphase separationen_US
dc.subjectphase separation enhance layeren_US
dc.subjectmulti-peaken_US
dc.titleInfluence of barrier growth temperature on the properties of InGaN/GaN quantum wellsen_US
dc.typeProceedings Paperen_US
dc.identifier.doi10.1117/12.426844en_US
dc.identifier.journalLIGHT-EMITTING DIODES: RESEARCH MANUFACTURING, AND APPLICATIONS Ven_US
dc.citation.volume4278en_US
dc.citation.spage141en_US
dc.citation.epage149en_US
dc.contributor.department友訊交大聯合研發中心zh_TW
dc.contributor.departmentD Link NCTU Joint Res Ctren_US
dc.identifier.wosnumberWOS:000169777200020-
Appears in Collections:Conferences Paper


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