THICKNESS EFFECT ON HYDROGEN PLASMA TREATMENT ON POLYCRYSTALLINE SILICON THIN-FILMS

doi:10.1063/1.114261

標題:	THICKNESS EFFECT ON HYDROGEN PLASMA TREATMENT ON POLYCRYSTALLINE SILICON THIN-FILMS
作者:	LIOU, BW WU, YH LEE, CL LEI, TF 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics
公開日期:	29-五月-1995
URI:	http://dx.doi.org/10.1063/1.114261 http://hdl.handle.net/11536/1912
ISSN:	0003-6951
DOI:	10.1063/1.114261
期刊:	APPLIED PHYSICS LETTERS
Volume:	66
Issue:	22
起始頁:	3013
結束頁:	3014
顯示於類別：	期刊論文