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dc.contributor.authorHuang, HYen_US
dc.contributor.authorShu, CKen_US
dc.contributor.authorLin, WCen_US
dc.contributor.authorLiao, KCen_US
dc.contributor.authorChuang, CHen_US
dc.contributor.authorLee, MCen_US
dc.contributor.authorChen, WHen_US
dc.contributor.authorChen, WKen_US
dc.contributor.authorLee, YYen_US
dc.date.accessioned2014-12-08T15:27:01Z-
dc.date.available2014-12-08T15:27:01Z-
dc.date.issued2000en_US
dc.identifier.isbn4-900526-13-4en_US
dc.identifier.urihttp://hdl.handle.net/11536/19233-
dc.description.abstractTime-resolved photoluminescence spectra were used to characterize isoelectronically doped GaN:In films. Our results indicate that the recombination lifetime of donor-bound-exciton transition of pure GaN exhibits strong dependence on temperature. When In is doped into GaN, the recombination lifetime decreases sharply from 68 ps to 30 ps, irregardless of measured temperature and In doping concentration. The cause for this appearance is not clear at present. It might be related to the isoelectronic In impurity itself in GaN, which creates shallow energy levels that predominate the recombination process.en_US
dc.language.isoen_USen_US
dc.subjectGaNen_US
dc.subjectrecombination life timeen_US
dc.subjectisoelectronic dopingen_US
dc.titleEffects in carrier dynamics of Isolectronic In doped in GaN films grown by metalorganic vapor phase epitaxyen_US
dc.typeProceedings Paperen_US
dc.identifier.journalPROCEEDINGS OF THE INTERNATIONAL WORKSHOP ON NITRIDE SEMICONDUCTORSen_US
dc.citation.volume1en_US
dc.citation.spage610en_US
dc.citation.epage613en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000171608500155-
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