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dc.contributor.authorChang, KMen_US
dc.contributor.authorJou, CFen_US
dc.contributor.authorLuo, JJen_US
dc.contributor.authorKuo, LYen_US
dc.contributor.authorDeng, ICen_US
dc.contributor.authorLiang, Cen_US
dc.contributor.authorLuhmann, NCen_US
dc.date.accessioned2014-12-08T15:27:05Z-
dc.date.available2014-12-08T15:27:05Z-
dc.date.issued2000en_US
dc.identifier.isbn4-89114-004-6en_US
dc.identifier.urihttp://hdl.handle.net/11536/19310-
dc.description.abstractCantilever type microswitches have advantages of low electrostatic actuation voltage and high isolation in RF applications. Of particularly importance, it can be integrated with microstrip line in series or shunt connection mode for building the RF circuit or system directly. Figure 1(a) is an idea switch with single pole, single throw configuration (SPST). As shown in figure 1(b). the microswitch in our study is similar in structure to an ideal switch. Suspended aluminum membrane with perforation holes is used as a movable electrode that will form the resistive contact with the bottom electrode underneath at the free end through electrostatic actuation process. The fabrication processes will be described as shown in figure 2 for constructing the 4 um gap structure of microswitches. Figure 3 shows the structure of microswitch using field emission scanning electron microscope (FESEM). The bending of the membrane was resulted from the thermal histogram of lithography and dry release process in reactive ion etching system, which can be controlled by process parameters optimization. Hysteresis measurement on HP-4156 as shown in figure 4 has demonstrated the operation of microswitch. The actuation voltage shows higher value than expected from simulation due to the existence of residual stress. However, the small curvature of this cantilever type membrane indicates the feasibility of building the application circuit from this low stress membrane microswitches.en_US
dc.language.isoen_USen_US
dc.titleFabrication of cantilever type microswitches using surface micromachining technologyen_US
dc.typeProceedings Paperen_US
dc.identifier.journalMICROPROCESSES AND NANOTECHNOLOGY 2000, DIGEST OF PAPERSen_US
dc.citation.spage78en_US
dc.citation.epage79en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000166793600037-
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