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dc.contributor.authorLin, SAHen_US
dc.contributor.authorHsieh, CRen_US
dc.contributor.authorHsieh, TCen_US
dc.contributor.authorHsu, KYen_US
dc.date.accessioned2014-12-08T15:27:09Z-
dc.date.available2014-12-08T15:27:09Z-
dc.date.issued1999en_US
dc.identifier.isbn0-8194-3287-3en_US
dc.identifier.issn0277-786Xen_US
dc.identifier.urihttp://hdl.handle.net/11536/19386-
dc.identifier.urihttp://dx.doi.org/10.1117/12.363921en_US
dc.description.abstractThe kinetics of the recording, compensating, and developing processes in two typical thermal fixing procedures (L-H-L and H-L procedures) are analyzed. The optimum condition (in terms of the fixing temperature, compensation time and material parameters) for each fixing procedures are obtained under the boundary condition of short-circuit. Experimental results are shown which are in qualitative agreement with the theory in L-H-L procedure.en_US
dc.language.isoen_USen_US
dc.subjectphotorefractive crystalen_US
dc.subjectthermal fixingen_US
dc.subjectlithium niobate crystalen_US
dc.subjectvolume hologramen_US
dc.titleOptimum conditions for thermal fixing of volume holograms in Fe : LiNbO3en_US
dc.typeProceedings Paperen_US
dc.identifier.doi10.1117/12.363921en_US
dc.identifier.journalPHOTOREFRACTIVE FIBER AND CRYSTAL DEVICES: MATERIALS, OPTICAL PROPERTIES, AND APPLICATIONS Ven_US
dc.citation.volume3801en_US
dc.citation.spage83en_US
dc.citation.epage90en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000083314900010-
Appears in Collections:Conferences Paper


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