Optimum conditions for thermal fixing of volume holograms in Fe : LiNbO3

Abstract

The kinetics of the recording, compensating, and developing processes in two typical thermal fixing procedures (L-H-L and H-L procedures) are analyzed. The optimum condition (in terms of the fixing temperature, compensation time and material parameters) for each fixing procedures are obtained under the boundary condition of short-circuit. Experimental results are shown which are in qualitative agreement with the theory in L-H-L procedure.