Optimum conditions for thermal fixing of volume holograms in Fe : LiNbO3

doi:10.1117/12.363921

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	Lin, SAH	en_US
dc.contributor.author	Hsieh, CR	en_US
dc.contributor.author	Hsieh, TC	en_US
dc.contributor.author	Hsu, KY	en_US
dc.date.accessioned	2014-12-08T15:27:09Z	-
dc.date.available	2014-12-08T15:27:09Z	-
dc.date.issued	1999	en_US
dc.identifier.isbn	0-8194-3287-3	en_US
dc.identifier.issn	0277-786X	en_US
dc.identifier.uri	http://hdl.handle.net/11536/19386	-
dc.identifier.uri	http://dx.doi.org/10.1117/12.363921	en_US
dc.description.abstract	The kinetics of the recording, compensating, and developing processes in two typical thermal fixing procedures (L-H-L and H-L procedures) are analyzed. The optimum condition (in terms of the fixing temperature, compensation time and material parameters) for each fixing procedures are obtained under the boundary condition of short-circuit. Experimental results are shown which are in qualitative agreement with the theory in L-H-L procedure.	en_US
dc.language.iso	en_US	en_US
dc.subject	photorefractive crystal	en_US
dc.subject	thermal fixing	en_US
dc.subject	lithium niobate crystal	en_US
dc.subject	volume hologram	en_US
dc.title	Optimum conditions for thermal fixing of volume holograms in Fe : LiNbO3	en_US
dc.type	Proceedings Paper	en_US
dc.identifier.doi	10.1117/12.363921	en_US
dc.identifier.journal	PHOTOREFRACTIVE FIBER AND CRYSTAL DEVICES: MATERIALS, OPTICAL PROPERTIES, AND APPLICATIONS V	en_US
dc.citation.volume	3801	en_US
dc.citation.spage	83	en_US
dc.citation.epage	90	en_US
dc.contributor.department	光電工程學系	zh_TW
dc.contributor.department	Department of Photonics	en_US
dc.identifier.wosnumber	WOS:000083314900010	-
顯示於類別：	會議論文

文件中的檔案：

000083314900010.pdf

若為 zip 檔案，請下載檔案解壓縮後，用瀏覽器開啟資料夾中的 index.html 瀏覽全文。