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Title: Exposure schedule for multiplexing holograms in photopolymer
Authors: Lin, SAH
Hsu, KY
Chen, WZ
Whang, WT
光電工程學系
Department of Photonics
Keywords: photopolymer material;PMMA;Holographic data storage;multiplexing schedule;dynamic range
Issue Date: 1999
Abstract: We present dynamics of the grating formation process in phenanthrenequinone- (PQ-) doped poly(methyl methacrylate) (PMMA) photo-polymer. The exposure schedule for multiplexing holograms to achieve equal-strength storage in a single location is described. The analysis method is valid for any saturated media, thus the results can be applied to other photo-polymer materials with similar kinetics.
URI: http://hdl.handle.net/11536/19387
http://dx.doi.org/10.1117/12.363923
ISBN: 0-8194-3287-3
ISSN: 0277-786X
DOI: 10.1117/12.363923
Journal: PHOTOREFRACTIVE FIBER AND CRYSTAL DEVICES: MATERIALS, OPTICAL PROPERTIES, AND APPLICATIONS V
Volume: 3801
Begin Page: 100
End Page: 106
Appears in Collections:Conferences Paper


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