Exposure schedule for multiplexing holograms in photopolymer

標題:	Exposure schedule for multiplexing holograms in photopolymer
作者:	Lin, SAH Hsu, KY Chen, WZ Whang, WT 光電工程學系 Department of Photonics
關鍵字:	photopolymer material;PMMA;Holographic data storage;multiplexing schedule;dynamic range
公開日期:	1999
摘要:	We present dynamics of the grating formation process in phenanthrenequinone- (PQ-) doped poly(methyl methacrylate) (PMMA) photo-polymer. The exposure schedule for multiplexing holograms to achieve equal-strength storage in a single location is described. The analysis method is valid for any saturated media, thus the results can be applied to other photo-polymer materials with similar kinetics.
URI:	http://hdl.handle.net/11536/19387 http://dx.doi.org/10.1117/12.363923
ISBN:	0-8194-3287-3
ISSN:	0277-786X
DOI:	10.1117/12.363923
期刊:	PHOTOREFRACTIVE FIBER AND CRYSTAL DEVICES: MATERIALS, OPTICAL PROPERTIES, AND APPLICATIONS V
Volume:	3801
起始頁:	100
結束頁:	106
顯示於類別：	會議論文

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