標題: | THE EFFECTS OF ND2O3 ADDITIVES AND AL2O3-SIO2-TIO2 SINTERING AIDS ON THE ELECTRICAL-RESISTIVITY OF (BA,SR)TIO3 PTCR CERAMICS |
作者: | LAI, CH WENG, CT TSENG, TY 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | POSITIVE TEMPERATURE COEFFICIENT OF RESISTANCE;ACCEPTOR STATE DENSITY;GRAIN BOUNDARIES;PERMITTIVITY;BARRIERS |
公開日期: | 1-四月-1995 |
摘要: | The influences of Nd donors and Al2O3-SiO2-TiO2 (AST) sintering aids on the electrical properties of (Ba,Sr)TiO3 materials have been investigated. The room-temperature resistivity and the temperature coefficient of the anomalous resistivity rise were used to characterize the performance of the samples. From derivations based on the Heywang-Jonker barrier model, both characterizing parameters are expected to increase as a result of higher acceptor-state density at the grain boundary. The surface acceptor density, whose value was extracted from the slope in the Arrhenius plot of resistivity versus 1/(T epsilon(m)), where epsilon(m) is the measured permittivity and T the absolute temperature, was found to decrease with the Nd content and increase with the AST dopant. A satisfactory interpretation of the observed variations in resistivity-temperature curves caused by additions of various dopants was thus obtained in the light of the resultant acceptor state density. |
URI: | http://hdl.handle.net/11536/1990 |
ISSN: | 0254-0584 |
期刊: | MATERIALS CHEMISTRY AND PHYSICS |
Volume: | 40 |
Issue: | 3 |
起始頁: | 168 |
結束頁: | 172 |
顯示於類別: | 期刊論文 |