A comparative study of CVD TiN and CVD TaN diffusion barriers for copper interconnection

標題:	A comparative study of CVD TiN and CVD TaN diffusion barriers for copper interconnection
作者:	Sun, SC Tsai, MH Chiu, HT Chuang, SH Tsai, CE 奈米中心 Nano Facility Center
公開日期:	1995
URI:	http://hdl.handle.net/11536/19961
ISBN:	0-7803-2700-4
期刊:	INTERNATIONAL ELECTRON DEVICES MEETING, 1995 - IEDM TECHNICAL DIGEST
起始頁:	461
結束頁:	464
顯示於類別：	會議論文