標題: A comparative study of CVD TiN and CVD TaN diffusion barriers for copper interconnection
作者: Sun, SC
Tsai, MH
Chiu, HT
Chuang, SH
Tsai, CE
奈米中心
Nano Facility Center
公開日期: 1995
URI: http://hdl.handle.net/11536/19961
ISBN: 0-7803-2700-4
期刊: INTERNATIONAL ELECTRON DEVICES MEETING, 1995 - IEDM TECHNICAL DIGEST
起始頁: 461
結束頁: 464
Appears in Collections:Conferences Paper