Characterization and optimization of NO-nitrided gate oxide by RTP

Title:	Characterization and optimization of NO-nitrided gate oxide by RTP
Authors:	Sun, SC Chen, CH Yen, DLW Lin, CJ 奈米中心 Nano Facility Center
Issue Date:	1995
URI:	http://hdl.handle.net/11536/19962
ISBN:	0-7803-2700-4
Journal:	INTERNATIONAL ELECTRON DEVICES MEETING, 1995 - IEDM TECHNICAL DIGEST
Begin Page:	687
End Page:	690
Appears in Collections:	Conferences Paper