Characterization and optimization of NO-nitrided gate oxide by RTP

標題:	Characterization and optimization of NO-nitrided gate oxide by RTP
作者:	Sun, SC Chen, CH Yen, DLW Lin, CJ 奈米中心 Nano Facility Center
公開日期:	1995
URI:	http://hdl.handle.net/11536/19962
ISBN:	0-7803-2700-4
期刊:	INTERNATIONAL ELECTRON DEVICES MEETING, 1995 - IEDM TECHNICAL DIGEST
起始頁:	687
結束頁:	690
顯示於類別：	會議論文