SIMULATION STUDY OF A NEW PHASE-SHIFTING MASK - HALFTONE-RIM

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DC Field	Value	Language
dc.contributor.author	LOONG, WA	en_US
dc.contributor.author	YEH, CH	en_US
dc.contributor.author	SHY, SL	en_US
dc.date.accessioned	2014-12-08T15:27:43Z	-
dc.date.available	2014-12-08T15:27:43Z	-
dc.date.issued	1995	en_US
dc.identifier.isbn	0-8194-1788-2	en_US
dc.identifier.uri	http://hdl.handle.net/11536/19976	-
dc.identifier.uri	http://dx.doi.org/10.1117/12.209275	en_US
dc.language.iso	en_US	en_US
dc.subject	PHASE-SHIFTING MASK	en_US
dc.subject	HALF-TONE	en_US
dc.subject	RIM	en_US
dc.subject	HALF-TONE-RIM	en_US
dc.subject	SIMULATION	en_US
dc.subject	OFF-AXIS ILLUMINATION	en_US
dc.subject	SUBMICRON LITHOGRAPHY	en_US
dc.title	SIMULATION STUDY OF A NEW PHASE-SHIFTING MASK - HALFTONE-RIM	en_US
dc.type	Proceedings Paper	en_US
dc.identifier.doi	10.1117/12.209275	en_US
dc.identifier.journal	OPTICAL/LASER MICROLITHOGRAPHY VIII	en_US
dc.citation.volume	2440	en_US
dc.citation.spage	448	en_US
dc.citation.epage	457	en_US
dc.contributor.department	應用化學系	zh_TW
dc.contributor.department	Department of Applied Chemistry	en_US
dc.identifier.wosnumber	WOS:A1995BD19S00039	-
Appears in Collections:	Conferences Paper

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