Fabrication of Ti and Co silicided shallow junctions using novel techniques

標題:	Fabrication of Ti and Co silicided shallow junctions using novel techniques
作者:	Ma, MP Lin, CT Cheng, HC 奈米中心 Nano Facility Center
公開日期:	1995
URI:	http://hdl.handle.net/11536/19998
ISBN:	7-5053-3285-6
期刊:	PROCEEDINGS OF THE FOURTH INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED-CIRCUIT TECHNOLOGY
起始頁:	A662
結束頁:	A664
顯示於類別：	會議論文