Process-related instability mechanisms for the hydrogenated amorphous silicon thin film transistors

標題:	Process-related instability mechanisms for the hydrogenated amorphous silicon thin film transistors
作者:	Tai, YH Su, FC Feng, MS Cheng, HC 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics
公開日期:	1995
URI:	http://hdl.handle.net/11536/20001
ISBN:	7-5053-3285-6
期刊:	PROCEEDINGS OF THE FOURTH INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED-CIRCUIT TECHNOLOGY
起始頁:	A730
結束頁:	A732
Appears in Collections:	Conferences Paper