THE SELECTIVITY OF REACTIVE ION ETCH OF GA0.51IN0.49P/GAAS

標題:	THE SELECTIVITY OF REACTIVE ION ETCH OF GA0.51IN0.49P/GAAS
作者:	WU, JW CHAN, SH LIN, KC CHANG, CY CHANG, EY 電控工程研究所 Institute of Electrical and Control Engineering
公開日期:	1994
URI:	http://hdl.handle.net/11536/20059
ISBN:	1-55899-237-5
ISSN:	0272-9172
期刊:	ADVANCED METALLIZATION FOR DEVICES AND CIRCUITS - SCIENCE, TECHNOLOGY AND MANUFACTURABILITY
Volume:	337
起始頁:	755
結束頁:	760
顯示於類別：	會議論文