FABRICATION AND CHARACTERISTICS OF RF MAGNETRON-SPUTTERED ITO THIN-FILMS

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	WU, WF	en_US
dc.contributor.author	CHIOU, BS	en_US
dc.date.accessioned	2014-12-08T15:27:50Z	-
dc.date.available	2014-12-08T15:27:50Z	-
dc.date.issued	1994	en_US
dc.identifier.isbn	0-8194-1445-X	en_US
dc.identifier.uri	http://hdl.handle.net/11536/20081	-
dc.identifier.uri	http://dx.doi.org/10.1117/12.175003	en_US
dc.language.iso	en_US	en_US
dc.title	FABRICATION AND CHARACTERISTICS OF RF MAGNETRON-SPUTTERED ITO THIN-FILMS	en_US
dc.type	Proceedings Paper	en_US
dc.identifier.doi	10.1117/12.175003	en_US
dc.identifier.journal	DESIGN, SIMULATION, AND FABRICATION OF OPTOELECTRONIC DEVICES AND CIRCUITS	en_US
dc.citation.volume	2150	en_US
dc.citation.spage	319	en_US
dc.citation.epage	325	en_US
dc.contributor.department	電子工程學系及電子研究所	zh_TW
dc.contributor.department	Department of Electronics Engineering and Institute of Electronics	en_US
dc.identifier.wosnumber	WOS:A1994BA43F00036	-
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