SIMULATION AND FABRICATION OF A NEW PHASE-SHIFTING MASK FOR 0.35 MU-M CONTACT HOLE PATTERN TRANSFER - HALF-TONE-RIM

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DC Field	Value	Language
dc.contributor.author	LOONG, WA	en_US
dc.contributor.author	SHY, SL	en_US
dc.contributor.author	GUO, GC	en_US
dc.contributor.author	CHOU, YL	en_US
dc.date.accessioned	2014-12-08T15:27:54Z	-
dc.date.available	2014-12-08T15:27:54Z	-
dc.date.issued	1994	en_US
dc.identifier.isbn	0-8194-1356-9	en_US
dc.identifier.uri	http://hdl.handle.net/11536/20163	-
dc.identifier.uri	http://dx.doi.org/10.1117/12.167280	en_US
dc.language.iso	en_US	en_US
dc.title	SIMULATION AND FABRICATION OF A NEW PHASE-SHIFTING MASK FOR 0.35 MU-M CONTACT HOLE PATTERN TRANSFER - HALF-TONE-RIM	en_US
dc.type	Proceedings Paper	en_US
dc.identifier.doi	10.1117/12.167280	en_US
dc.identifier.journal	13TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT	en_US
dc.citation.volume	2087	en_US
dc.citation.spage	380	en_US
dc.citation.epage	389	en_US
dc.contributor.department	應用化學系	zh_TW
dc.contributor.department	Department of Applied Chemistry	en_US
dc.identifier.wosnumber	WOS:A1994BZ89N00038	-
Appears in Collections:	Conferences Paper

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