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dc.contributor.authorLOONG, WAen_US
dc.contributor.authorSHY, SLen_US
dc.contributor.authorGUO, GCen_US
dc.contributor.authorCHOU, YLen_US
dc.date.accessioned2014-12-08T15:27:54Z-
dc.date.available2014-12-08T15:27:54Z-
dc.date.issued1994en_US
dc.identifier.isbn0-8194-1356-9en_US
dc.identifier.urihttp://hdl.handle.net/11536/20163-
dc.identifier.urihttp://dx.doi.org/10.1117/12.167280en_US
dc.language.isoen_USen_US
dc.titleSIMULATION AND FABRICATION OF A NEW PHASE-SHIFTING MASK FOR 0.35 MU-M CONTACT HOLE PATTERN TRANSFER - HALF-TONE-RIMen_US
dc.typeProceedings Paperen_US
dc.identifier.doi10.1117/12.167280en_US
dc.identifier.journal13TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENTen_US
dc.citation.volume2087en_US
dc.citation.spage380en_US
dc.citation.epage389en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:A1994BZ89N00038-
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