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dc.contributor.authorHsu, Wei-Tingen_US
dc.contributor.authorLiao, Yu-Anen_US
dc.contributor.authorHsu, Feng-Changen_US
dc.contributor.authorChiu, Pei-Chinen_US
dc.contributor.authorChyi, Jen-Innen_US
dc.contributor.authorChang, Wen-Haoen_US
dc.date.accessioned2014-12-08T15:27:55Z-
dc.date.available2014-12-08T15:27:55Z-
dc.date.issued2011-08-15en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.3624464en_US
dc.identifier.urihttp://hdl.handle.net/11536/20201-
dc.description.abstractThe optical properties of GaAsSb-capped InAs quantum dots (QDs) with different capping layer thickness are investigated. Both the emission energy and the recombination lifetime are found to be correlated with the capping layer thicknesses. Theoretical calculations indicate that the quantum confinement and the wave function distribution of hole states are sensitive to the GaAsSb capping layer thickness. The Sb induced change in QD size also plays a role in the optical properties of GaAsSb-capped QDs. Controlling the GaAsSb capping layer thickness is a feasible way to tailor the InAs QDs for long-wavelength applications. (C) 2011 American Institute of Physics. [doi:10.1063/1.3624464]en_US
dc.language.isoen_USen_US
dc.titleEffects of GaAsSb capping layer thickness on the optical properties of InAs quantum dotsen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.3624464en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume99en_US
dc.citation.issue7en_US
dc.citation.epageen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000294208900050-
dc.citation.woscount4-
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