THERMAL-OXIDATION OF LIGHTLY-DOPED AND HEAVILY-DOPED SILICON IN PURE N2O

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	SUN, SC	en_US
dc.contributor.author	CHANG, HY	en_US
dc.date.accessioned	2014-12-08T15:27:57Z	-
dc.date.available	2014-12-08T15:27:57Z	-
dc.date.issued	1993	en_US
dc.identifier.isbn	2-86332-135-8	en_US
dc.identifier.uri	http://hdl.handle.net/11536/20220	-
dc.language.iso	en_US	en_US
dc.title	THERMAL-OXIDATION OF LIGHTLY-DOPED AND HEAVILY-DOPED SILICON IN PURE N2O	en_US
dc.type	Proceedings Paper	en_US
dc.identifier.journal	ESSDERC '93 - PROCEEDINGS OF THE 23RD EUROPEAN SOLID-STATE DEVICE RESEARCH CONFERENCE	en_US
dc.citation.spage	403	en_US
dc.citation.epage	406	en_US
dc.contributor.department	奈米中心	zh_TW
dc.contributor.department	Nano Facility Center	en_US
dc.identifier.wosnumber	WOS:A1993BB18A00079	-
顯示於類別：	會議論文