| 標題: | 高/低摻雜濃度矽晶於N2O氣體的熱氧化及其元件應用 Thermal oxidation of lightly and heavily doped silicon in N2O and it device applications |
| 作者: | 張鴻儀 孫喜眾 張國明 電子研究所 |
| 公開日期: | 1984 |
| URI: | http://140.113.39.130/cdrfb3/record/nctu/#NT732428006 http://hdl.handle.net/11536/52025 |
| 顯示於類別： | 畢業論文 |
- 高/低摻雜濃度矽晶於N2O氣體的熱氧化及元件應用 / 張鴻儀;Hong-Yi Chang;孫喜眾;張國明;S.C. Sun ; K.M. Chang
- THERMAL-OXIDATION OF LIGHTLY-DOPED AND HEAVILY-DOPED SILICON IN PURE N2O / SUN, SC;CHANG, HY
- TUNNEL OXIDE PREPARED BY THERMAL-OXIDATION OF THIN POLYSILICON FILM ON SILICON (TOPS) / WU, SL;LEE, CL;LEI, TF
- Investigation of the polarity asymmetry on the electrical characteristics of thin polyoxides grown on N+ polysilicon / Wu, SL;Chen, CY;Lin, TY;Lee, CL;Lei, TF
- RAPID THERMAL-OXIDATION OF LIGHTLY DOPED SILICON IN N2O / SUN, SC;WANG, LS;YEH, FL;LAI, TS;LIN, YH
- Regrowth of High Quality Heavily Si-Doped nGaN Utilizing Nano-Rod GaN Template / Kuo, Cheng-Huang;Chang, Li-Chuan;Chou, Hsiu-Mei
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