高/低摻雜濃度矽晶於N2O氣體的熱氧化及其元件應用

Full metadata record

DC Field	Value	Language
dc.contributor.author	張鴻儀	en_US
dc.contributor.author	孫喜眾	en_US
dc.contributor.author	張國明	en_US
dc.date.accessioned	2014-12-12T02:03:04Z	-
dc.date.available	2014-12-12T02:03:04Z	-
dc.date.issued	1984	en_US
dc.identifier.uri	http://140.113.39.130/cdrfb3/record/nctu/#NT732428006	en_US
dc.identifier.uri	http://hdl.handle.net/11536/52025	-
dc.language.iso	en_US	en_US
dc.title	高/低摻雜濃度矽晶於N2O氣體的熱氧化及其元件應用	zh_TW
dc.title	Thermal oxidation of lightly and heavily doped silicon in N2O and it device applications	en_US
dc.type	Thesis	en_US
dc.contributor.department	電子研究所	zh_TW
Appears in Collections:	Thesis