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dc.contributor.authorChiang, C. H.en_US
dc.contributor.authorWu, Y. H.en_US
dc.contributor.authorHsieh, M. C.en_US
dc.contributor.authorYang, C. H.en_US
dc.contributor.authorWang, J. F.en_US
dc.contributor.authorChen, Ross C. C.en_US
dc.contributor.authorChang, L.en_US
dc.contributor.authorChen, J. F.en_US
dc.date.accessioned2014-12-08T15:28:03Z-
dc.date.available2014-12-08T15:28:03Z-
dc.date.issued2011-08-15en_US
dc.identifier.issn0169-4332en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.apsusc.2011.04.006en_US
dc.identifier.urihttp://hdl.handle.net/11536/20312-
dc.description.abstractThis study investigates the effects of surfactant and segregation from InAs surface quantum dots (SQDs) by incorporating antimony (Sb) into the QD layers. The Sb surfactant effect extends planar growth and suppresses dot formation. Incorporating Sb can reduce the density of SQDs by more than two orders of magnitude. Photoluminescence (PL) reveals enhancement in the optical properties of InAs SQDs as the Sb beam equivalent pressure (BEP) increases. This improvement is caused by the segregation of Sb on the surface of SQDs, which reduces non-radiative recombination and suppresses carrier loss. The dark line at the SQDs surface in the transmission electron microscopic image suggests that the incorporated Sb probably segregates close to the surface of the SQDs. These results indicate a marked Sb segregation effect that can be exploited to improve the surface-sensitive properties of SQDs for biological sensing. Crown Copyright (C) 2011 Published by Elsevier B. V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectInAsen_US
dc.subjectSurface quantum doten_US
dc.subjectAntimonyen_US
dc.subjectSurfactanten_US
dc.subjectSegregationen_US
dc.titleImproving the photoluminescence properties of self-assembled InAs surface quantum dots by incorporation of antimonyen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.apsusc.2011.04.006en_US
dc.identifier.journalAPPLIED SURFACE SCIENCEen_US
dc.citation.volume257en_US
dc.citation.issue21en_US
dc.citation.spage8784en_US
dc.citation.epage8787en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000292539700006-
dc.citation.woscount4-
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