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dc.contributor.authorLin, Chun-Yuen_US
dc.contributor.authorChu, Li-Weien_US
dc.contributor.authorKer, Ming-Douen_US
dc.contributor.authorSong, Ming-Hsiangen_US
dc.contributor.authorJou, Chewn-Puen_US
dc.contributor.authorLu, Tse-Huaen_US
dc.contributor.authorTseng, Jen-Chouen_US
dc.contributor.authorTsai, Ming-Hsienen_US
dc.contributor.authorHsu, Tsun-Laien_US
dc.contributor.authorHung, Ping-Fangen_US
dc.contributor.authorChang, Tzu-Hengen_US
dc.date.accessioned2014-12-08T15:28:05Z-
dc.date.available2014-12-08T15:28:05Z-
dc.date.issued2012en_US
dc.identifier.isbn978-1-4577-1679-9en_US
dc.identifier.urihttp://hdl.handle.net/11536/20362-
dc.description.abstractTo protect radio-frequency (RF) integrated circuits from electrostatic discharge (ESD) damages, silicon-controlled rectifier (SCR) devices have been used as main on-chip ESD protection devices due to their high ESD robustness and low parasitic capacitance in nanoscale CMOS technologies. In this work, the SCR device assisted with an inductor to resonate at the selected frequency band for RF performance fine tune was proposed. Besides, the inductor can be also designed to improve the turn-on efficiency of the SCR device for ESD protection. Verified in a 65-nm CMOS process, the ESD protection design with the inductor-triggered SCR for 60-GHz RF applications can achieve good RF performances and high ESD robustness.en_US
dc.language.isoen_USen_US
dc.subjectElectrostatic discharge (ESD)en_US
dc.subjectradio-frequency (RF)en_US
dc.subjectsilicon-controlled rectifier (SCR)en_US
dc.titleESD Protection Structure with Inductor-Triggered SCR for RF Applications in 65-nm CMOS Processen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2012 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM (IRPS)en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.identifier.wosnumberWOS:000309183100123-
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