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dc.contributor.authorLiu, S. L.en_US
dc.contributor.authorChang, H. M.en_US
dc.contributor.authorChang, T.en_US
dc.contributor.authorKao, H. L.en_US
dc.contributor.authorCheng, C. H.en_US
dc.contributor.authorChin, A.en_US
dc.date.accessioned2014-12-08T15:28:09Z-
dc.date.available2014-12-08T15:28:09Z-
dc.date.issued2011en_US
dc.identifier.isbn978-1-60768-260-8en_US
dc.identifier.issn1938-5862en_US
dc.identifier.urihttp://hdl.handle.net/11536/20371-
dc.identifier.urihttp://dx.doi.org/10.1149/1.3629965en_US
dc.description.abstractIn this paper, the commercial 0.5-mu m AlGaAs/InGaAs/GaAs pseudo-morphic high electron mobility transistors were subjected to both high-drain voltage and high-temperature stresses for investigating reliability issues. The results reveal that the stress-induced trapping phenomena near two-dimensional electron gas layer should be responsible for the different drain current collapses. The decay level of the DC and the small-signal characteristics increases with the stress voltage and/or the operation temperature. The self-consistent model was established through the de-embedded and the non-linear fitting processes, which can be used to estimate the DC and RF small-signal characteristics degradation under high-drain voltage and high-temperature stress.en_US
dc.language.isoen_USen_US
dc.titleThe Reliability Study and Device Modeling for p-HEMT Microwave Power Transistorsen_US
dc.typeProceedings Paperen_US
dc.identifier.doi10.1149/1.3629965en_US
dc.identifier.journalSTATE-OF-THE-ART PROGRAM ON COMPOUND SEMICONDUCTORS 53 (SOTAPOCS 53)en_US
dc.citation.volume41en_US
dc.citation.issue6en_US
dc.citation.spage175en_US
dc.citation.epage187en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000309536900017-
Appears in Collections:Conferences Paper


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