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dc.contributor.authorLin, Yen-Fuen_US
dc.contributor.authorWang, Sheng-Tsungen_US
dc.contributor.authorPao, Chia-Chenen_US
dc.contributor.authorLi, Ya-Chien_US
dc.contributor.authorLai, Cheng-Chiehen_US
dc.contributor.authorLin, Chung-Kuanen_US
dc.contributor.authorHsu, Shih-Yingen_US
dc.contributor.authorJian, Wen-Binen_US
dc.date.accessioned2014-12-08T15:29:11Z-
dc.date.available2014-12-08T15:29:11Z-
dc.date.issued2013-01-21en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.4789554en_US
dc.identifier.urihttp://hdl.handle.net/11536/21035-
dc.description.abstractMetal-graphene contact recently attracts much attention because of its effects on the performance and the operational speed of graphene field-effect transistor. Simple two-probe graphene devices on mechanically exfoliated graphene flakes are fabricated and the temperature behavior of resistance is measured from room temperature down to liquid helium temperature for the study of electron transport in the interface. Comparing experimental data with several different transport theories, it is confirmed that the model of fluctuation-induced tunneling conduction describes precisely the electron transport and indicates the existence of a thin insulating layer in the metal-graphene interface. Through the interface probing by electron transport measurements, the way to reduce the contact resistance is suggested. (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4789554]en_US
dc.language.isoen_USen_US
dc.titleProbing into the metal-graphene interface by electron transport measurementsen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.4789554en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume102en_US
dc.citation.issue3en_US
dc.citation.epageen_US
dc.contributor.department電機學院zh_TW
dc.contributor.departmentCollege of Electrical and Computer Engineeringen_US
dc.identifier.wosnumberWOS:000314032600071-
dc.citation.woscount6-
Appears in Collections:Articles


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