標題: | Probing into the metal-graphene interface by electron transport measurements |
作者: | Lin, Yen-Fu Wang, Sheng-Tsung Pao, Chia-Chen Li, Ya-Chi Lai, Cheng-Chieh Lin, Chung-Kuan Hsu, Shih-Ying Jian, Wen-Bin 電機學院 College of Electrical and Computer Engineering |
公開日期: | 21-一月-2013 |
摘要: | Metal-graphene contact recently attracts much attention because of its effects on the performance and the operational speed of graphene field-effect transistor. Simple two-probe graphene devices on mechanically exfoliated graphene flakes are fabricated and the temperature behavior of resistance is measured from room temperature down to liquid helium temperature for the study of electron transport in the interface. Comparing experimental data with several different transport theories, it is confirmed that the model of fluctuation-induced tunneling conduction describes precisely the electron transport and indicates the existence of a thin insulating layer in the metal-graphene interface. Through the interface probing by electron transport measurements, the way to reduce the contact resistance is suggested. (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4789554] |
URI: | http://dx.doi.org/10.1063/1.4789554 http://hdl.handle.net/11536/21035 |
ISSN: | 0003-6951 |
DOI: | 10.1063/1.4789554 |
期刊: | APPLIED PHYSICS LETTERS |
Volume: | 102 |
Issue: | 3 |
結束頁: | |
顯示於類別: | 期刊論文 |