Transfer of a continuous-relief lenticular array onto a quartz substrate by using SIL combined with the dry-etching method

Abstract

This study presents the technological process for producing a lenticular array on quartz. With scanning immersion lithography used to define the 3D lenticular array structure on a quartz substrate, inductively coupled plasma-reactive ion etching (ICP-RIE) is able to directly etch the structure. Based on the surface measurement, ICP-RIE can completely etch the surface structure onto the quartz substrate, and the surface roughness can reach 30 nm. Furthermore, after the optical measurement of stereoscopic images, the left and the right stereoscopic images can be successfully transmitted to the corresponding places without crosstalk and with a splitting efficiency close to 80%. As a result, this technology allows for the production of a lenticular structure with various changes on the quartz surface.