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dc.contributor.authorChen, S. C.en_US
dc.contributor.authorSung, K. Y.en_US
dc.contributor.authorTzeng, W. Y.en_US
dc.contributor.authorWu, K. H.en_US
dc.contributor.authorJuang, J. Y.en_US
dc.contributor.authorUen, T. M.en_US
dc.contributor.authorLuo, C. W.en_US
dc.contributor.authorLin, J-Yen_US
dc.contributor.authorKobayashi, T.en_US
dc.contributor.authorKuo, H. C.en_US
dc.date.accessioned2014-12-08T15:29:29Z-
dc.date.available2014-12-08T15:29:29Z-
dc.date.issued2013-02-20en_US
dc.identifier.issn0022-3727en_US
dc.identifier.urihttp://dx.doi.org/10.1088/0022-3727/46/7/075002en_US
dc.identifier.urihttp://hdl.handle.net/11536/21210-
dc.description.abstractDifferent oxidation states of titanium nitride thin films, including pure TiN(h 0 0), TiN1-xOx(h 0 0), Ti2O3(0 0 l) and pure anatase TiO2(0 0 l), were prepared by pulsed laser deposition with various oxygen pressures (P-O2) using a TiN target. Elaborative evolutions of the crystal and electronic structures of the obtained films were examined systematically by x-ray diffraction and x-ray absorption spectroscopy. We found that the Ti2O3(0 0 l) film, which was prepared at oxygen pressures P-O2 = 10(-4) Torr, exhibited the maximum room temperature ferromagnetism (RTFM) behaviour. The bound magnetic polaron model is used to clarify the origin of RTFM in these films.en_US
dc.language.isoen_USen_US
dc.titleMicrostructure and magnetic properties of oxidized titanium nitride thin films in situ grown by pulsed laser depositionen_US
dc.typeArticleen_US
dc.identifier.doi10.1088/0022-3727/46/7/075002en_US
dc.identifier.journalJOURNAL OF PHYSICS D-APPLIED PHYSICSen_US
dc.citation.volume46en_US
dc.citation.issue7en_US
dc.citation.epageen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department物理研究所zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentInstitute of Physicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000314471900009-
dc.citation.woscount4-
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