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dc.contributor.authorLee, Yeeu-Changen_US
dc.contributor.authorYeh, Shiang-Chihen_US
dc.contributor.authorChou, Yen-Yuen_US
dc.contributor.authorTsai, Pei-Jungen_US
dc.contributor.authorPan, Jui-Wenen_US
dc.contributor.authorChou, Hsiu-Meien_US
dc.contributor.authorHou, Chia-Hungen_US
dc.contributor.authorChang, Yung-Yuanen_US
dc.contributor.authorChu, Min-Shengen_US
dc.contributor.authorWu, Cheng-Huien_US
dc.contributor.authorHo, Chun-Hsienen_US
dc.date.accessioned2014-12-08T15:29:43Z-
dc.date.available2014-12-08T15:29:43Z-
dc.date.issued2013-05-01en_US
dc.identifier.issn0167-9317en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.mee.2013.01.027en_US
dc.identifier.urihttp://hdl.handle.net/11536/21345-
dc.description.abstractThis study employed roller imprint lithography and dry etching to fabricate patterned sapphire substrates (PSSs) of convex-shape with features of various heights. A soft polymer, polydimethylsiloxane (PDMS), was used as a mold to duplicate the pattern of a hard silicon template. The imprinted material was spin deposited onto a PDMS mold and transferred to the sapphire substrate using roller imprinting equipment. Inductive coupled plasma (ICP) etching was then used to fabricate the PSS. After epitaxial growth and chip processing, the current-voltage characteristics and light output of various LEDs were measured. The results demonstrate that the PSS process did not detract from the electrical properties of the LEDs; in fact, the output power of the proposed PSS LEDs was 25-30% greater than that of conventional LEDs. Simulation results show that PSS LEDs with structures of various heights would enhance optical efficiency in a manner similar to that demonstrated in these experiments. (C) 2013 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectRoller imprint lithographyen_US
dc.subjectLight-emitting diodesen_US
dc.subjectLight extraction efficiencyen_US
dc.titleHigh-efficiency InGaN-based LEDs grown on patterned sapphire substrates using nanoimprinting technologyen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.mee.2013.01.027en_US
dc.identifier.journalMICROELECTRONIC ENGINEERINGen_US
dc.citation.volume105en_US
dc.citation.issueen_US
dc.citation.spage86en_US
dc.citation.epage90en_US
dc.contributor.department光電系統研究所zh_TW
dc.contributor.departmentInstitute of Photonic Systemen_US
dc.identifier.wosnumberWOS:000316529600016-
dc.citation.woscount4-
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