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dc.contributor.authorSong, Emil B.en_US
dc.contributor.authorLian, Boben_US
dc.contributor.authorKim, Sung Minen_US
dc.contributor.authorLee, Sejoonen_US
dc.contributor.authorChung, Tien-Kanen_US
dc.contributor.authorWang, Minshengen_US
dc.contributor.authorZeng, Caifuen_US
dc.contributor.authorXu, Guangyuen_US
dc.contributor.authorWong, Kinen_US
dc.contributor.authorZhou, Yien_US
dc.contributor.authorRasool, Haider I.en_US
dc.contributor.authorSeo, David H.en_US
dc.contributor.authorChung, Hyun-Jongen_US
dc.contributor.authorHeo, Jinseongen_US
dc.contributor.authorSeo, Sunaeen_US
dc.contributor.authorWang, Kang L.en_US
dc.date.accessioned2014-12-08T15:29:53Z-
dc.date.available2014-12-08T15:29:53Z-
dc.date.issued2011-07-25en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.3619816en_US
dc.identifier.urihttp://hdl.handle.net/11536/21426-
dc.description.abstractWith the motivation of realizing an all graphene-based circuit for low power, we present a reliable nonvolatile graphene memory device, single-layer graphene (SLG) ferroelectric field-effect transistor (FFET). We demonstrate that exfoliated single-layer graphene can be optically visible on a ferroelectric lead-zirconate-titanate (PZT) substrate and observe a large memory window that is nearly equivalent to the hysteresis of the PZT at low operating voltages in a graphene FFET. In comparison to exfoliated graphene, FFETs fabricated with chemical vapor deposited (CVD) graphene exhibit enhanced stability through a bi-stable current state operation with long retention time. In addition, we suggest that the trapping/de-trapping of charge carriers in the interface states is responsible for the anti-hysteresis behavior in graphene FFET on PZT. (C) 2011 American Institute of Physics. [doi:10.1063/1.3619816]en_US
dc.language.isoen_USen_US
dc.titleRobust bi-stable memory operation in single-layer graphene ferroelectric memoryen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.3619816en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume99en_US
dc.citation.issue4en_US
dc.citation.epageen_US
dc.contributor.department機械工程學系zh_TW
dc.contributor.departmentDepartment of Mechanical Engineeringen_US
dc.identifier.wosnumberWOS:000293475500037-
dc.citation.woscount42-
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